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Consult USTRON for a complete range of sputtering target or vapor deposition materials

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Optical thin-film materials

Since 2002, USTRON has been involved in the manufacture and sale of a variety of high-purity vacuum vapor deposition materials at our factories in China.

We provide a variety of vacuum vapor deposition materials, including oxides, fluorides, sulfides and pure metals, etc. We can also fabricate thin-film materials in a range of different shapes or sizes depending on the hearth liner.

We can accommodate a diverse range of customer needs.

Low refractive index materials

Product nameChemical symbolRefractive index
(550nm)
Arch-shapedTabletGranular 
Magnesium fluoride MgF2 1.38 -  
Calcium fluoride CaF2 1.42 - -
Silicon dioxide SiO2 1.46  
MU1 SiO2+Al2O3 1.48 - -  

Medium refractive index materials

Product nameChemical symbolRefractive index
(550nm)
Arch-shapedTabletGranular 
Lanthanum fluoride LaF3 1.58 - -
Cerium fluoride CF3 1.63 - -
Aluminum oxide Al2O3 1.63  
Magnesium oxide MgO 1.70 - -
MG-01 Al2O3+La2O3 1.70 - -
Yttrium oxide Y2O3 1.87 - -

High refractive index materials

Product nameChemical symbolRefractive index
(550nm)
Arch-shapedTabletGranular 
Silicon monoxide SiO 1.90 -  
Hafnium oxide HfO2 1.95 -
Zirconium oxide ZrO2 2.05  
GL2 Ta2O5+ZrO2 2.10 - -
Tantalum pentoxide Ta2O5 2.10 -  
MU5 ZrO2+TiO2 2.10 -  
MU2 LaTiO3 2.10 -  
GL7 Ta2O5+TiO2 2.13 -
MU2-C LaTiO3 2.15 -
Niobium pentoxide Nb2O5 2.25 - -  
Cerium oxide CeO2 2.35 - -
Titanium monoxide TiO 2.35 -  
Titanium dioxide TiO2 2.35 -
Titanium trioxide Ti2O3 2.35 -
MU3 Ti3O5 2.35 -  
Zinc sulfide ZnS 2.4/1200nm - -
Silicon Si 3.4/3000nm -  
Germanium Ge 4.4/2000nm -

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